IIT BHU Varanasi invites applications for Assistant Professor’s job; OCIs also eligible
THE JHARKHAND STORY NETWORK Ranchi, Nov. 25: IIT BHU Varanasi has invited online applications from Indians and Overseas Citizens of India…
Source: The Times of India
THE JHARKHAND STORY NETWORK
Ranchi, Nov. 25: IIT BHU Varanasi has invited online applications from Indians and Overseas Citizens of India (OCIs) for faculty positions at the level of Assistant Professor.
According to the advertisement posted on the institution’s website, applications are invited for positions at various departments such as Architecture, Planning and Designing, Ceramic Engineering, Chemical Engineering and Technology, Civil Engineering , Computer Science and Engineering, Electrical Engineering, Electronics Engineering, Mechanical Engineering, Metallurgical Engineering, Mining Engineering and Mathematical Sciences.
The applications for faculty positions can also be filled by Persons of Indian Origin (PIO) and Foreign Nationals for contractual appointments up to five years. The post will then be renewed further based on performance.
Salary
The post of Assistant Professor Grade-I is entitled for a salary of ₹ 1,01,500-Rs 1,67,400. While the post of Assistant Professor Grade-II will receive a salary of ₹ 57,700-Rs 98,200.
Details
For details please visit the university’s website.
Who are eligible?
For the post of Assistant Professor Grade-I, candidates with PhD first class or equivalent at the preceding degree in the appropriate branch are eligible to apply. The candidates should have a very good academic record throughout and must also have at least three years of teaching, research, and industrial experience. The experience should be in a reputed organisation.
For Assistant Professor Grade-II, candidates having PhD with first class or equivalent at the preceding degree in the appropriate branch, with a very good academic record throughout are eligible to apply. The candidates should have demonstrated strong research capabilities in terms of publications in reputed peer reviewed journals of good impact factor and/or patents.
